A. Fumar-Pici

EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300

T. Wallow, D. Civay, S. Wang, 2012, Advanced Lithography.

Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration

A. Fumar-Pici, A.-L. Charley, M. Dusa, 2012, Advanced Lithography.