Miki Kashiwakura

发表

Organic solvent-free sugar-based transparency nanopatterning material derived from biomass for eco-friendly optical biochips using green lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014, Photonics Europe.

EB and EUV lithography using inedible cellulose-based biomass resist material

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2016, SPIE Advanced Lithography.

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2015, Advanced Lithography.

Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014, Photonics Europe.

EUV lithography using water-developable resist material derived from biomass

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2013, Advanced Lithography.

Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2011 .

Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014 .

Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2017 .

Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

Takahiro Kozawa, Seiichi Tagawa, Akihiro Oshima, 2014 .