Richard H. Krukar

SCATTEROMETRY APPLIED TO MICROELECTRONICS PROCESSING. PART II

John R. McNeil, Lisa-Michelle Milner, S. Sohail H. Naqvi, 1993 .

Using scattered-light modeling for semiconductor critical dimension metrology and calibration

Donald R. Hush, Gary A. Peterson, John R. McNeil, 1993, Advanced Lithography.

Reactive ion etching profile and depth characterization using statistical and neural network analysis of light scattering data

Joseph B. Kruskal, Richard A. Gottscho, A. Kornblit, 1993 .

Etch depth estimation of large-period silicon gratings with multivariate calibration of rigorously simulated diffraction profiles

David M. Haaland, John R. McNeil, Richard A. Gottscho, 1994 .