Hiroo Kinoshita

发表

Three-aspherical-mirror system for EUV lithography

Takeo Watanabe, Hiroaki Oizumi, Masaaki Ito, 1998, Advanced Lithography.

Relationships between EUV resist outgassing and contamination deposition at Selete

Kazuyuki Matsumaro, Julius Joseph Santillan, Toshiro Itani, 2011, Advanced Lithography.

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2014 .

Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope

Tsuneo Terasawa, Hidehiro Watanabe, Tsuyoshi Amano, 2013, Photomask Technology.

Soft and hard x-ray reflectivities of multilayers fabricated by alternating-material sputter deposition

Hiroo Kinoshita, Yoshikazu Ishii, Hisataka Takenaka, 1991, Optics & Photonics.

Correlation study on resist outgassing between EUV and e-beam irradiation

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2014, Advanced Lithography.

Study of Dill's B parameter measurement of EUV resist

Atsushi Sekiguchi, Takeo Watanabe, Yoko Matsumoto, 2015, Advanced Lithography.

At-wavelength observation of phase defect using focused lensless microscope

Youichi Usui, Tsuyoshi Amano, Takeo Watanabe, 2014, Advanced Lithography.

Current status of ASET-HIT EUV phase-shifting point diffraction interferometer

Takeo Watanabe, Masahito Niibe, Hiroo Kinoshita, 2001, SPIE Optics + Photonics.

Mask technology of extreme-ultraviolet lithography

Takeo Watanabe, Masahito Niibe, Hiroo Kinoshita, 1998, Photomask and Next Generation Lithography Mask Technology.

A highly accurate alignment technique using a dual grating: alignment algorithm with oblique incidence method

Hiroo Kinoshita, A. Une, M. Iki, 1985 .

Development for the alignment procedure of three-aspherical mirror optics

Takeo Watanabe, Hiroo Kinoshita, Katsuhiko Murakami, 2000, Advanced Lithography.

Design of imaging system for EUVL

Takeo Watanabe, Hiroo Kinoshita, Takeshi Namioka, 1997, Optics & Photonics.

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

Katsumi Ohmori, Takeo Watanabe, Ei Yano, 2000, Advanced Lithography.

Recent advances of three-aspherical-mirror system for EUVL

Yanqiu Li, Takeo Watanabe, Shinji Okazaki, 2000, Advanced Lithography.

Development of a reflectometer for a large EUV mirror in NewSUBARU

Takeo Watanabe, Hiroo Kinoshita, Tetsuo Harada, 2015, Other Conferences.

Pattern inspection of EUV mask using an EUV microscope

Takeo Watanabe, Hiroo Kinoshita, Tsuneyuki Haga, 2003, Photomask Japan.

Evaluating EUV mask pattern imaging with two EUV microscopes

Kenneth A. Goldberg, Hiroo Kinoshita, Hak-Seung Han, 2008 .

Development of partially fluorinated EUV-resist polymers for LER and sensitivity improvement

Takashi Sasaki, Osamu Yokokoji, Takeo Watanabe, 2008, SPIE Advanced Lithography.

Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection

Katsumi Midorikawa, Hiroo Kinoshita, Tetsuo Harada, 2013, Optics & Photonics - Optical Engineering + Applications.

Contribution of EUV resist components to the non-cleanable contaminations

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2014, Advanced Lithography.

Study of EUV outgassing spatial distribution toward witness plate in the EUV outgas tester

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2013, Advanced Lithography.

Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics

Takeo Watanabe, Masahito Niibe, Hiroo Kinoshita, 1998, Optics & Photonics.

Analysis of EUV resist outgassing depended on the dosage

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2015, Advanced Lithography.

Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Takeo Watanabe, Hiroo Kinoshita, Tetsuo Harada, 2012, Other Conferences.

At wavelength observation of phase defect embedded in EUV mask using microscope technique

Hidehiro Watanabe, Tsuyoshi Amano, Takeo Watanabe, 2014, Advanced Lithography.

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tsuyoshi Amano, Takeo Watanabe, Hiroo Kinoshita, 2016 .

Multilayers for next generation EUVL at 6.X nm

Eric M. Gullikson, Takeo Watanabe, Hiroo Kinoshita, 2011, Optics + Optoelectronics.

Phase imaging of EUV masks using a lensless EUV microscope

Takeo Watanabe, Hiroo Kinoshita, Tetsuo Harada, 2013, Photomask and Next Generation Lithography Mask Technology.

Optimization of photoacid generator in CA resist for EUVL

Hiroji Komano, Takeo Watanabe, Hiroo Kinoshita, 2006, SPIE Advanced Lithography.

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Takeo Watanabe, Hwan-Seok Seo, 2008, SPIE Advanced Lithography.

Phase defect observation using an EUV microscope

Takeo Watanabe, Hiroo Kinoshita, Morio Hosoya, 2006, SPIE Advanced Lithography.

Printability of native blank defects and programmed defects and their stack structures

Kenneth A. Goldberg, Iacopo Mochi, Jenah Harris-Jones, 2011, Photomask Technology.

Evaluation of resist outgassing by EUV irradiation

Kazuhiko Hamamoto, Takeo Watanabe, Hiroo Kinoshita, 2004, SPIE Advanced Lithography.

Evaluation of novel resist materials for EUV lithography

Takeo Watanabe, Hiroo Kinoshita, Ichihiro Aratani, 2009, Advanced Lithography.

Resist outgassing characterization for qualification in high power EUV lithography

Soichi Inoue, Yukiko Kikuchi, Takeo Watanabe, 2012, Advanced Lithography.

EUV mask cleaning by dry and wet processes

Hiroo Kinoshita, Hajime Nii, Takeo Watanabe, 2001, Photomask Japan.

Performance of Cr mask for extreme-ultraviolet lithography

Takeo Watanabe, Hiroo Kinoshita, Harushige Tsubakino, 2001, Photomask Japan.

EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source

Takeo Watanabe, Hiroo Kinoshita, Yusuke Tanaka, 2015, Other Conferences.

Actinic mask inspection using an extreme ultraviolet microscope

Takeo Watanabe, Hiroo Kinoshita, Tetsuo Harada, 2009, Photomask Japan.

Progress in the development of three-aspherical mirror optics for EUVL

Jay Daniel, Takeo Watanabe, Hiroo Kinoshita, 1999, Optics & Photonics.

Present and future requirements of soft x-ray projection lithography

Hiroo Kinoshita, 1993, Optics & Photonics.

Thermal stability of Mo-based multilayer x-ray mirrors

Hiroo Kinoshita, Tsuneyuki Haga, Yoshikazu Ishii, 1994, Optics & Photonics.

Present status of the ASET at-wavelength phase-shifting point diffraction interferometer

Takeo Watanabe, Masahito Niibe, Hiroo Kinoshita, 2000, SPIE Optics + Photonics.

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Takeo Watanabe, Hiroo Kinoshita, Katsuhiko Murakami, 2000, Advanced Lithography.

Design of a LIGA beamline using a multilayer-coated reflection mirror

Takeo Watanabe, Masahito Niibe, Hiroo Kinoshita, 1998, Optics & Photonics.

Phase imaging results of phase defect using micro coherent EUV scatterometry microscope

Tsuyoshi Amano, Takeo Watanabe, Hiroo Kinoshita, 2015, SPIE Photomask Technology.

Development of novel positive-tone resists for EUVL

Iwao Nishiyama, Takeo Watanabe, Hiroaki Oizumi, 2008, SPIE Advanced Lithography.

Fine pattern replication using ETS-1 three-aspherical mirror imaging system

Hiroo Kinoshita, K. Hamamoto, S. Okazaki, 2001 .

Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors

Hiroaki Oizumi, Masaaki Ito, Hiromasa Yamanashi, 1998 .

Comparison of Resist Family Outgassing Characterization between EUV and EB

Soichi Inoue, Hiroyuki Tanaka, Toshiya Takahashi, 2013 .

At-Wavelength Extreme Ultraviolet Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors

Hiroo Kinoshita, Tetsuo Harada, Mitsunori Toyoda, 2012 .

Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes

Hiroo Kinoshita, Tsutomu Shoki, Noriyuki Sakaya, 2005 .

Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility

Hiroo Kinoshita, Tetsuo Harada, Michael D. Kriese, 2016 .

Development of Transmission Grating for EUV Interference Lithography of 1X nm HP

Hiroo Kinoshita, Tetsuo Harada, Masaki Kuki, 2015 .

Direct evaluation of surface roughness of substrate and interfacial roughness in molybdenum/silicon multilayers using extreme ultraviolet reflectometer

Hiroo Kinoshita, Osamu Nozawa, Morio Hosoya, 2007 .

Current Status and Prospect of Extreme Ultraviolet Lithography

Hiroo Kinoshita, Takeo Watanabe, Takeo Watanabe, 2008 .

Fine Pattern Replication by EUV Lithography

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2001 .

Evaluation of Finished Extreme Ultraviolet Lithography (EUVL) Masks Using a EUV Microscope

Hiroo Kinoshita, Tsuneyuki Haga, Satoshi Kakunai, 2003 .

Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist

Hiroo Kinoshita, Hideo Hada, Hiroshi Komano, 2004 .

Development of High-Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials

Hiroo Kinoshita, Tetsuo Harada, Masaki Kuki, 2015 .

Development of Experimental Methodology for Highly Efficient Wafer-Level Evaluation of X-Ray Radiation Effects on Semiconductor Devices

Hiroo Kinoshita, Togo Kudo, Takaki Hatsui, 2014, IEEE Transactions on Nuclear Science.

A Multilayer-Coated Reflection Mirror for Microfabrication

Hiroo Kinoshita, James L. Wood, Takeo Watanabe, 1998 .

A dual grating alignment technique for x‐ray lithography

Hiroo Kinoshita, Atsunobu Une, Makoto Iki, 1983 .

A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography

Masahito Niibe, Hiroo Kinoshita, Kiyoto Mashima, 1997 .

Development of coherent scatterometry microscope

Hiroo Kinoshita, Tetsuo Harada, Takeo Watanabe, 2011 .

Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

Hiroo Kinoshita, Morio Hosoya, Kazuhiro Hamamoto, 2007 .

Air bearing guided high speed XY stage.

Hiroo Kinoshita, Kimiyoshi Deguchi, Munenori Kanai, 1986 .

Evaluating the Optical Index of Ta and Ta-Based Absorbers for an Extreme Ultraviolet Mask Using Extreme Ultraviolet Reflectometry

Hiroo Kinoshita, Osamu Nozawa, Osamu Nagarekawa, 2008 .

Two‐mirror telecentric optics for soft x‐ray reduction lithography

Hiroo Kinoshita, Tsuneyuki Haga, Kenji Kurihara, 1991 .

Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography

Hiroo Kinoshita, Hideo Hada, Hiroshi Komano, 2005 .

Changes in refractive index and in chemical state of synchrotron radiation irradiated fluorinated polyimide films

Toshiyuki Horiuchi, Yasuko Yamada Maruo, Hiroo Kinoshita, 1996 .

Resist Outgassing Characteristics in Extreme Ultraviolet Lithography

Hiroo Kinoshita, Hideo Hada, Hiroshi Komano, 2004 .

The Photo-absorption Coefficient Measurement of EUV Resist

Hiroo Kinoshita, Yasuyuki Fukushima, Takeo Watanabe, 2009 .

Demonstrating 30-nm spatial resolution of three-multilayer-mirror objective for extreme ultraviolet microscopy: Imaging test by observing lithography mask

Tsuneo Terasawa, Tsuyoshi Amano, Hiroo Kinoshita, 2014 .

Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope

Hiroo Kinoshita, Kazuhiro Hamamoto, Takeo Watanabe, 2006 .

Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation

Hiroo Kinoshita, Morio Hosoya, Noriyuki Sakaya, 2007 .

Characteristics of CA Resist in EUV Lithography

Hiroo Kinoshita, Hideo Hada, Hiroshi Komano, 2002 .

EUV Lithography: An Historical Perspective

Hiroo Kinoshita, Obert Wood, 2008 .

Novel Evaluation System for Extreme Ultraviolet Lithography Resist in NewSUBARU

Hiroo Kinoshita, Tsutomu Shoki, Noriyuki Sakaya, 2005 .

A Study of Acid Diffusion Behaviors of PAG by using Top Coat Method for EUVL

Atsushi Sekiguchi, Hiroo Kinoshita, Takeo Watanabe, 2014 .

CA Resist with Side Chain PAG Group for EUV Resist

Hiroo Kinoshita, Yasuyuki Fukushima, Hideaki Shiotani, 2006 .

Comparison of Resist Outgassing Characterization between High Power EUV and EB

Soichi Inoue, Hiroyuki Tanaka, Toshiya Takahashi, 2012 .

Optimization of Photoacid Generator in Photoacid Generation-Bonded Resist

Hiroo Kinoshita, Yasuyuki Fukushima, Ryuji Ohnishi, 2008 .

Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy

Hiroo Kinoshita, Shigeo Irie, Hideo Hada, 2001 .

Mask defect inspection using an extreme ultraviolet microscope

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2005 .

Multilayer sputter deposition stress control

Hiroo Kinoshita, Tsuneyuki Haga, Marcia C. K. Tinone, 1996 .

Investigation of Contamination Removal from Finished EUVL Mask

Hiroo Kinoshita, Morio Hosoya, Tsutomu Shoki, 2003 .

Resist Outgassing by EUV Irradiation

Masaru Sasago, Masayuki Endo, Hiroo Kinoshita, 2001 .

Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .

Transmission Measurement Using Extreme Ultraviolet Light for the Development of Extreme Ultraviolet Resist

Hiroo Kinoshita, Yasuyuki Fukushima, Ryuji Ohnishi, 2009 .

PAG Study of PAG Bonded Resist for EUV and EB Lithography

Hiroo Kinoshita, Yasuyuki Fukushima, Ryuji Ohnishi, 2008 .

Angular dependency of off-axis illumination on 100-nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system

Hiroo Kinoshita, Yong-Chae Chung, Takeo Watanabe, 2004 .

Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22 nm Resolution

Daiju Shiono, Hiroo Kinoshita, Hideo Hada, 2010 .

Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability

Tsuneo Terasawa, Tsuyoshi Amano, Takeshi Yamane, 2013 .

Optical properties and Faraday effect of ceramic terbium gallium garnet for a room temperature Faraday rotator.

Noriaki Miyanaga, Hisanori Fujita, Koji Tsubakimoto, 2011, Optics express.

Development of EUV Resists in University of Hyogo

Hiroo Kinoshita, Takeo Watanabe, 2007 .

Imaging of extreme ultraviolet lithographic masks with programmed substrate defects

David T. Attwood, Hiroo Kinoshita, T. Haga, 1994 .

Actinic mask metrology for extreme ultraviolet lithography

Masayuki Endo, Hiroo Kinoshita, Tsuneyuki Haga, 2004 .

Imaging Performance Improvement of an Extreme Ultraviolet Microscope

Yuya Yamaguchi, Hiroo Kinoshita, Tetsuo Harada, 2010 .

Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter

Hiroo Kinoshita, Noriyuki Sakaya, Kazuhiro Hamamoto, 2008 .

Study on critical dimension of printable phase defects using an EUV microscope

Hiroo Kinoshita, Takahiro Yoshizumi, Takeo Watanabe, 2009 .

EUV Interference Lithography for 1X nm

Hiroo Kinoshita, Yamaguchi Yuya, Naohiro Matsuda, 2011 .