Nobuyuki Matsuzawa

发表

Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region

David A. Dixon, Nobuyuki Matsuzawa, Akihiko Ishitani, 2001, SPIE Advanced Lithography.

Optimization of dual BARC structures for hyper-NA immersion lithography

Hiroichi Kawahira, Hiroyuki Nakano, Nobuyuki Matsuzawa, 2006, SPIE Advanced Lithography.

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region

Shigeo Irie, Ei Yano, Shinji Okazaki, 2001, SPIE Advanced Lithography.

Recent advantages of bilevel resists based on silsesquioxane for ArF lithography

Masaru Sasago, Takeshi Ohfuji, Masayuki Endo, 1998, Advanced Lithography.

Resist cluster formation model and development simulation

Atsuko Yamaguchi, Seiichi Tagawa, Takeshi Ohfuji, 1998, Advanced Lithography.

Control of line edge roughness of ultrathin resist films subjected to EUV exposure

Man-Hyoung Ryoo, Hiroaki Oizumi, Ei Yano, 2001, SPIE Advanced Lithography.

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Hiroichi Kawahira, Masashi Yoshida, Nobuyuki Matsuzawa, 2006, SPIE Advanced Lithography.

Theoretical calculations of silylation reaction of photoresists

Takeshi Ohfuji, Masayuki Endo, Nobuyuki Matsuzawa, 1998, Advanced Lithography.

Sub 0.1mm Pattern Fabrication Using a 193-nm TSI Process

Masaru Sasago, Masayuki Endo, Nobuyuki Matsuzawa, 1998 .

Study of high photo-speed top surface imaging process using chemically amplified resist

Takahiro Matsuo, Masaru Sasago, Masayuki Endo, 1998 .

Semiempirical calculations of the polarizability and second-order hyperpolarizability of fullerenes (C60 and C70), and model aromatic compounds

David A. Dixon, Nobuyuki Matsuzawa, D. Dixon, 1992 .

Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region

Hiroaki Oizumi, Ei Yano, David A. Dixon, 1999 .

Theoretical estimation of absorption coefficients of various polymers at 13 nm

Hiroaki Oizumi, Ei Yano, Shinji Okazaki, 2000 .

Theoretical Estimation of Absorption Coefficients of Various Polymers at 13nm

Hiroaki Oizumi, Ei Yano, Shinji Okazaki, 1999 .

Vapor Sorption and Electrical Response of Au‐Nanoparticle– Dendrimer Composites

Akio Yasuda, Tobias Vossmeyer, Yvonne Joseph, 2007 .

Pattern collapse in the top surface imaging process after dry development

Takahiro Matsuo, Masaru Sasago, Masayuki Endo, 1998 .

Semiempirical calculations of hyperpolarizabilities for donor-acceptor molecules: comparison to experiment

David A. Dixon, Nobuyuki Matsuzawa, D. Dixon, 1992 .

Reduction of line edge roughness in the top surface imaging process

Takahiro Matsuo, Masaru Sasago, Masayuki Endo, 1998 .

Bond energies in organofluorine systems: applications to Teflon® and fullerenes

David A. Dixon, Nobuyuki Matsuzawa, D. Dixon, 1995 .

Time-dependent density functional theory calculations of the photoabsorption of fluorinated alkanes

David A. Dixon, Nobuyuki Matsuzawa, Akihiko Ishitani, 2003 .