Akihiko Ishitani

发表

Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region

David A. Dixon, Nobuyuki Matsuzawa, Akihiko Ishitani, 2001, SPIE Advanced Lithography.

Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region

Shigeo Irie, Ei Yano, Shinji Okazaki, 2001, SPIE Advanced Lithography.

Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region

Ei Yano, David A. Dixon, Shinji Okazaki, 2000, Advanced Lithography.

Copper Adsorption Behavior on Silicon Substrates (Special Issue on Sub-Half Micron Si Device and Process Technologies)

Akihiko Ishitani, Makoto Morita, Yoshimi Shiramizu, 1993 .

Trends in Capacitor Dielectrics for DRAMs (Special Issue on LSI Memories)

Koichi Ando, Akihiko Ishitani, Hirohito Watanabe, 1993 .

A high capacitive coupling ratio (HiCR) cell for single 3V power supply flash memories

Akihiko Ishitani, Yosiaki Hisamune, Kohji Kanamori, 1995 .

Semiconductor Technology : Evolution of Semiconductor Technology(Special Issue on System LSI : IC Technology That Supports Multimedia World)

Akihiko Ishitani, 1998 .

A high capacitive-coupling ratio (HiCR) cell for 3 V-only 64 Mbit and future flash memories

Akihiko Ishitani, Yosiaki Hisamune, Kohji Kanamori, 1993, Proceedings of IEEE International Electron Devices Meeting.

A High Capacitive Coupling Ratio (HiCR) Cell for Single 3 Volt Power Supply Flash Memories (Special Section on High Speed and High Density Multi Functional LSI Memories)

Yoshiyuki Suzuki, Akihiko Ishitani, Yosiaki Hisamune, 1994 .

Impurity profile measurement using VT-VSB characteristics

Akihiko Ishitani, Nobuhiro Endo, N. Kasai, 1984 .

Highly Reliable Ultra-Thin Tantalum Oxide Capacitors for ULSI DRAMs (Special Issue on Quarter Micron Si Device and Process Technologies)

Hiroshi Suzuki, Akihiko Ishitani, Satoshi Kamiyama, 1994 .

Non-empirical modeling on SiNx CVD

Akihiko Ishitani, Shiro Koseki, 1992 .

Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region

Hiroaki Oizumi, Ei Yano, David A. Dixon, 1999 .

Ultrathin Tantalum Oxide Capacitor Dielectric Layers Fabricated Using Rapid Thermal Nitridation prior to Low Pressure Chemical Vapor Deposition

Iwao Nishiyama, Akihiko Ishitani, Satoshi Kamiyama, 1993 .

Theoretical estimation of absorption coefficients of various polymers at 13 nm

Hiroaki Oizumi, Ei Yano, Shinji Okazaki, 2000 .

Time-Dependent Density Functional Theory Calculations of Photoabsorption Spectra in the Vacuum Ultraviolet Region

David A. Dixon, Akihiko Ishitani, Tsuyoshi Uda, 2001 .

Theoretical Estimation of Absorption Coefficients of Various Polymers at 13nm

Hiroaki Oizumi, Ei Yano, Shinji Okazaki, 1999 .

SiO2 / Si Interface Structures and Reliability Characteristics

Akihiko Ishitani, Masaru Tsukiji, E. Hasegawa, 1995 .

Selective silicon epitaxial growth for device-isolation

Akihiko Ishitani, Naoki Kasai, Nobuhiro Endo, 1986 .

Time-dependent density functional theory calculations of the photoabsorption of fluorinated alkanes

David A. Dixon, Nobuyuki Matsuzawa, Akihiko Ishitani, 2003 .