Naokatsu Ikegami

发表

Development of ballistic hot electron emitter and its applications to parallel processing: active-matrix massive direct-write lithography in vacuum and thin-film deposition in solutions

Masayoshi Esashi, Masanori Muroyama, Jun-ichi Shirakashi, 2015 .

Development of massive parallel electron beam write system

Masayoshi Esashi, Nobuyoshi Koshida, Akira Kojima, 2019, Photomask Japan.

超並列電子線描画装置用アクティブマトリックスナノ結晶シリコン電子源の開発と動作特性評価に関するレビュー;超並列電子線描画装置用アクティブマトリックスナノ結晶シリコン電子源の開発と動作特性評価に関するレビュー;Review of Development and Performance Evaluation of Active-matrix Nanocrystalline Si Electron Emitter Array for Massively Parallel Electron Beam Direct-write Lithography

Masayoshi Esashi, Masanori Muroyama, Shinya Yoshida, 2015 .

Development of a MEMS electrostatic condenser lens array for nc-Si surface electron emitters of the Massive Parallel Electron Beam Direct-Write system

Masanori Muroyama, Masayoshi Esashi, Shinya Yoshida, 2016, SPIE Advanced Lithography.

Simulation analysis of a miniaturized electron optics of the massively parallel electron-beam direct-write (MPEBDW) for multi-column system

Masayoshi Esashi, Masanori Muroyama, Shinya Yoshida, 2017, Advanced Lithography.

17×17並列電子源駆動システムの開発;17×17並列電子源駆動システムの開発;Development of a 17×17 Parallel Electron Beam Lithography System

Masayoshi Esashi, Shuji Tanaka, Masanori Muroyama, 2016 .

Active-matrix nanocrystalline Si electron emitter array for massively parallel direct-write electron-beam system: first results of the performance evaluation

Masayoshi Esashi, Takashi Yoshida, Nobuyoshi Koshida, 2012 .

Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics

Masayoshi Esashi, Nobuyoshi Koshida, Akira Kojima, 2013 .

An LSI for Massive Parallel Electron Beam Lithography: Its Design and Evaluation

Masayoshi Esashi, Shuji Tanaka, Masanori Muroyama, 2015 .

Development of MEMS pierce-type nanocrystalline Si electron-emitter array for massively parallel electron beam direct writing

Masayoshi Esashi, Shuji Tanaka, Shinya Yoshida, 2014, 2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS).

Characteristics of Very High-Aspect-Ratio Contact Hole Etching

Naokatsu Ikegami, Takayuki Matsui, Yasuhiro Horiike, 1997 .

Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays

Masayoshi Esashi, Nobuyoshi Koshida, Akira Kojima, 2015, Microsystems & Nanoengineering.