Shuichi Komatsu

Thin film joining for high-temperature performance of power semi-conductor devices

Hiroshi Nishikawa, Toshihide Takahashi, Tadashi Takemoto, 2010, Microelectron. Reliab..

Dielectric and Ferroelectric Properties of Heteroepitaxial Ba~xSr~1~-~xTiO~3 Films Grown on SrRuO~3/SrTiO~3 Substrates

Naoko Yanase, Noburu Fukushima, Kazuhide Abe, 1998 .

A newly developed model for stress induced slit-like voiding

Hisashi Kaneko, M. Miyauchi, Takashi Kawanoue, 1990, 28th Annual Proceedings on Reliability Physics Symposium.

Single crystal aluminum lines with excellent endurance against stress induced failure

Hisashi Kaneko, M. Miyauchi, Takashi Kawanoue, 1989, International Technical Digest on Electron Devices Meeting.