文
论文分享
演练场
杂货铺
论文推荐
字
编辑器下载
登录
注册
Shun-An Lin
发表
Electrical properties of metal-HfO2-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO2 gate dielectric
Fu-Chien Chiu, Joseph Ya-min Lee, Shun-An Lin, 2005, Microelectron. Reliab..