Kirk J. Strozewski

A new methodology to specify via and contact layer reticles for maximizing process latitude

Anthony Vacca, Joe Perez, Kirk J. Strozewski, 2003, SPIE Advanced Lithography.

Combining OPC and design for printability into 65-nm logic designs

Kevin D. Lucas, Jonathan L. Cobb, Robert Boone, 2004, SPIE Advanced Lithography.

Optimization of the contact layer for 90-nm node lithography

Kevin D. Lucas, Kirk J. Strozewski, Lena Zavyalova, 2003, SPIE Advanced Lithography.

The use of the manufacturing sensitivity model forms to comprehend layout manufacturing robustness for use during device design

Lawrence S. Melvin, Kirk J. Strozewski, Daniel N. Zhang, 2006, 7th International Symposium on Quality Electronic Design (ISQED'06).