J. Lingnau

发表

E-Beam Application Of Highly Sensitive Positive And Negative-Tone Resists For X-Ray Mask Making

Christian Ehrlich, Klaus Reimer, Siegfried Pongratz, 1989, Advanced Lithography.

Resist Modeling Near Resolution And Sensitivity Limits In X -Ray Lithography

Ralph Dr Dammel, J. Lingnau, J. Theis, 1989, Advanced Lithography.

Photocatalytic Novolak-based positive resist for X-ray lithography—kinetics and simulation

J. Lingnau, J. Theis, H.-L. Huber, 1987 .

Computer-aided resist modelling with extended XMAS in x-ray lithography

J. Lingnau, J. Theis, H.-L. Huber, 1989 .