Samuel N. Jones

Statistical measure for the sharpness of SEM images

Michael T. Postek, Nien-Fan Zhang, Robert D. Larrabee, 1997, Advanced Lithography.

Reference Material 8091: new scanning electron microscope sharpness standard

Michael T. Postek, Nien-Fan Zhang, Robert D. Larrabee, 2001, SPIE Advanced Lithography.

Intercomparison of SEM, AFM, and electrical linewidths

Richard A. Allen, Jeremiah R. Lowney, Michael T. Postek, 1999, Advanced Lithography.

Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry

Michael T. Postek, William J. Keery, Samuel N. Jones, 1989, Advanced Lithography.

Report on the NIST low-accelerating-voltage SEM magnification standard interlaboratory study

Michael T. Postek, Andras E. Vladar, William J. Keery, 1993, Advanced Lithography.

Interlaboratory Study on the Lithographically Produced Scanning Electron Microscope Magnification Standard Prototype

Samuel N. Jones, A. Vladár, M. Postek, 1993, Journal of research of the National Institute of Standards and Technology.

Application of transmission electron detection to SCALPEL mask metrology

Samuel N. Jones, L. Fetter, M. Postek, 1997 .

Experimental test of blind tip reconstruction for scanning probe microscopy

Michael T. Postek, John S. Villarrubia, Thomas B. Renegar, 2000 .