Martin Burkhardt

发表

EUV lithography at the 22nm technology node

John Arnold, Sudhar Raghunathan, Sander Bouten, 2010, Advanced Lithography.

Through-pitch correction of scattering effects in 193-nm alternating phase-shift masks

Ronald L. Gordon, Martin Burkhardt, Michael S. Hibbs, 2002, SPIE Advanced Lithography.

Dark field Double Dipole Lithography (DDL) for 45nm node and beyond

Jungchul Park, Stephen Hsu, J. Fung Chen, 2006, Photomask Japan.

Investigation of alternate mask absorbers in EUV lithography

Martin Burkhardt, M. Burkhardt, 2017, Advanced Lithography.

Insertion strategy for EUV lithography

Lei Sun, Ming He, Scott Halle, 2012, Advanced Lithography.

Dark Field Double Dipole Lithography (DDL) for back-end-of-line processes

Stephen Hsu, Jungchul Park, Derren Dunn, 2007, SPIE Advanced Lithography.

Spacer-defined double patterning for 20nm and beyond logic BEOL technology

Harry J. Levinson, Sean D. Burns, Martin Burkhardt, 2011, Advanced Lithography.

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Image fidelity improvement through optical proximity correction and its limits

Nakgeuon Seong, Martin Burkhardt, 2003, SPIE Advanced Lithography.

EUV patterning successes and frontiers

Yongan Xu, Nelson Felix, Hao Tang, 2016, SPIE Advanced Lithography.

Spacer defined double patterning for sub-72 nm pitch logic technology

Harry J. Levinson, Greg McIntyre, Yuansheng Ma, 2010, Advanced Lithography.

Integration of EUV lithography in the fabrication of 22-nm node devices

John Arnold, Sudhar Raghunathan, Yunfei Deng, 2009, Advanced Lithography.

Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders

Scott Halle, Ravi Bonam, Martin Burkhardt, 2015, Advanced Lithography.

Overcoming the challenges of 22-nm node patterning through litho-design co-optimization

Martin Burkhardt, S. Burns, C. Tabery, 2009, Advanced Lithography.

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Jo Finders, Jan B. van Schoot, Nakgeuon Seong, 2001, SPIE Advanced Lithography.

32 nm logic patterning options with immersion lithography

Zachary Baum, Scott Halle, Vito Dai, 2008, SPIE Advanced Lithography.

Thorough characterization of an EUV mask

Iacopo Mochi, Bruno La Fontaine, Long He, 2009, Photomask Japan.

Impact of resist blur on MEF, OPC, and CD control

Carlos Fonseca, Timothy A. Brunner, Nakgeuon Seong, 2004, SPIE Advanced Lithography.

Investigation of mask absorber induced image shift in EUV lithography

Nelson Felix, Martin Burkhardt, Luciana Meli, 2019, Advanced Lithography.

Modeling and experiments of non-telecentric thick mask effects for EUV lithography

Obert Wood, Martin Burkhardt, Chiew-seng Koay, 2009, Advanced Lithography.

Use of starburst patterns in optical lithography

Cyrus E. Tabery, Martin Burkhardt, 2007, SPIE Advanced Lithography.

Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)

Yongan Xu, Jason Meiring, Karen Petrillo, 2011, Advanced Lithography.

Flare evaluation of ASML alpha demo tool

Bruno La Fontaine, Obert Wood, Hiroyuki Mizuno, 2009, Advanced Lithography.

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools

Anita Fumar-Pici, Patrick P. Naulleau, Yunfei Deng, 2009, Advanced Lithography.

Exchangers for intrinsically safe data transmission technology

Martin Burkhardt, Adalbert Gabrysch, Rolf-Dieter Sommer, 2007 .

EUV implementation of assist features in contact patterns

Nicole Saulnier, James Word, Alexander Tritchkov, 2016, SPIE Advanced Lithography.

Implementation of assist features in EUV lithography

Andres Torres, James Word, Ananthan Raghunathan, 2015, Advanced Lithography.

Ultimate 2D resolution printing with negative tone development

Yongan Xu, Alexander Tritchkov, Martin Burkhardt, 2016, Advanced Lithography.

Advanced Material Studies for Additive Manufacturing in terms of Future Gear Application

Welf-Guntram Drossel, Thomas Töppel, Bernhard Müller, 2014 .

EUV OPC for 56nm metal pitch

Sudhar Raghunathan, Yunfei Deng, Emily Gallagher, 2011, Advanced Lithography.

EUV single exposure via patterning at aggressive pitch

Nelson Felix, Mary Breton, Karen Petrillo, 2021, Advanced Lithography.

The road towards aggressive pitch scaling with single exposure EUV

Nelson Felix, Stuart Sieg, Romain Lallement, 2021 .

Special Section Guest Editorial: Special Series Guest Editorial: EUV Masks

Vicky Philipsen, Martin Burkhardt, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Conformal antireflection coating on polycarbonate domes

Martin Burkhardt, Ulrike Schulz, Pallabi Paul, 2021, Optical Systems Design.

Test bench development and validation for blocked force measurements in six degree of freedom

Welf-Guntram Drossel, Martin Burkhardt, Eric Hensel, 2021, INTER-NOISE and NOISE-CON Congress and Conference Proceedings.

Comparative mobility degradation in modulation‐doped GaAs devices after e‐beam and x‐ray irradiation

Dimitri A. Antoniadis, Michael R. Melloch, Martin C. Peckerar, 1992 .

Illuminator design for the printing of regular contact patterns

Anthony Yen, Christopher J. Progler, Martin Burkhardt, 1998 .

X-ray nanolithography: Extension to the limits of the lithographic process

Mark L. Schattenburg, Scott Daniel Hector, Martin Burkhardt, 1996 .

Trilayer Development for 193 nm Immersion Lithography

Dario L. Goldfarb, Naftali E. Lustig, Sean D. Burns, 2007 .

High performance self‐aligned sub‐100 nm metal–oxide‐semiconductor field‐effect transistors using x‐ray lithography

Dimitri A. Antoniadis, Martin Burkhardt, Vincent V. Wong, 1994 .

The impact of self-assembled monolayer thickness in hybrid gate dielectrics for organic thin-film transistors

Martin Burkhardt, Ute Zschieschang, Hagen Klauk, 2009 .

Low‐Temperature Solution‐Processed Memory Transistors Based on Zinc Oxide Nanoparticles

Hendrik Faber, Martin Burkhardt, Hagen Klauk, 2009 .

Approaches to modulating stochastic effects in EUV lithography (Conference Presentation)

Nelson Felix, Mary Breton, Martin Burkhardt, 2019, International Conference on Extreme Ultraviolet Lithography 2019.

1 TOWARDS A PRODUCTION WORTHY 0 . 13 μ m PROCESS USING ALTERNATING PHASE SHIFT MASKS

Martin Burkhardt, Stephan Sinkwitz, Gert-Jan Janssen, 1999 .