Robert Routh

EUV lithography at the 22nm technology node

John Arnold, Sudhar Raghunathan, Sander Bouten, 2010, Advanced Lithography.

Enabling 35nm double patterning contact imaging using a novel CD shrink process

Satoru Shimura, Tetsu Kawasaki, Yoshitsugu Tanaka, 2008, SPIE Advanced Lithography.

Evaluation of double-patterning techniques for advanced logic nodes

Youri van Dommelen, Shinichiro Kawakami, Chiew-Seng Koay, 2010, Advanced Lithography.

Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes

Youri van Dommelen, Andrew Metz, Emil Schmitt-Weaver, 2009, Advanced Lithography.

Correlation of EUV resist performance metrics in micro-exposure and full-field EUV projection tools

Anita Fumar-Pici, Patrick P. Naulleau, Yunfei Deng, 2009, Advanced Lithography.

The use of EUV lithography to produce demonstration devices

John Arnold, Harry J. Levinson, Sander Bouten, 2008, SPIE Advanced Lithography.

Litho-only double patterning approaches: positive–negative versus positive–positive tone

Robert Routh, Tomoyuki Ando, Emil Schmitt-Weaver, 2009 .