Arpan P. Mahorowala

发表

Fabrication challenges for next-generation devices: Microelectromechanical systems for radio-frequency wireless communications

Inna V. Babich, Jennifer L. Lund, David E. Seeger, 2003 .

Fabrication challenges for next-generation devices: MEMS for rf wireless communications

Inna V. Babich, Jennifer L. Lund, David E. Seeger, 2002, SPIE Advanced Lithography.

Recent progress in electron-beam resists for advaced mask-making

Marie Angelopoulos, David R. Medeiros, Arpan P. Mahorowala, 2001, IBM J. Res. Dev..

High-resolution 248-nm bilayer resist

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1999, Advanced Lithography.

Current developments of a high-performance CA resist for mask-making application

Wei He, Marie Angelopoulos, Karen Petrillo, 2003, Photomask Japan.

Hardmask technology for sub-100 nm lithographic imaging

Scott Halle, Timothy A. Brunner, Marie Angelopoulos, 2003, SPIE Advanced Lithography.

Preliminary evaluation of line-edge roughness metrology based on CD-SAXS

Wen-li Wu, Eric K. Lin, Ronald L. Jones, 2004, SPIE Advanced Lithography.

Evolution of a 193-nm bilayer resist for manufacturing

William R. Brunsvold, Phillip J. Brock, David R. Medeiros, 2002, SPIE Advanced Lithography.

Improving the power-performance of multicore processors through optimization of lithography and thermal processing

Scott J. Bukofsky, Allen H. Gabor, Arpan P. Mahorowala, 2007, SPIE Advanced Lithography.

Mastering double exposure process window aware OPC by means of virtual targets

Lars W. Liebmann, Zachary Baum, Carlos Fonseca, 2006, SPIE Photomask Technology.

High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask making

Marie Angelopoulos, David R. Medeiros, Arpan P. Mahorowala, 2001, Photomask Japan.

Characterization of new aromatic polymers for 157-nm photoresist applications

Gregory Breyta, Hiroshi Ito, Gregory M. Wallraff, 2001, SPIE Advanced Lithography.

High-performance e-beam resist coupling excellent dry etch resistance and sub-100-nm resolution for advanced mask and device making

Marie Angelopoulos, Karen Petrillo, David R. Medeiros, 2001, SPIE Advanced Lithography.

193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers

Richard A. Di Pietro, Donald C. Hofer, Gregory M. Wallraff, 2000, Advanced Lithography.

Silicon containing polymer in applications for 193 nm high NA lithography processes

Karen Petrillo, Allen H. Gabor, Naftali E. Lustig, 2006, SPIE Advanced Lithography.

Meeting critical gate linewidth control needs at the 65 nm node

Scott Halle, Allen H. Gabor, Donald J. Samuels, 2006, SPIE Advanced Lithography.

193 lithography and RELACS processing for BEOL lithography

Linda M. Hadel, Richard A. Ferguson, Karen Petrillo, 2001, SPIE Advanced Lithography.

Impact of thin resist processes on post-etch LER

Hiroshi Ito, Martha I. Sanchez, Gregory M. Wallraff, 2003, SPIE Advanced Lithography.

Line edge roughness reduction by plasma curing photoresists

Arpan P. Mahorowala, Kuang-Jung Chen, Ratnam Sooriyakumaran, 2005, SPIE Advanced Lithography.

Feature profile evolution during the high density plasma etching of polysilicon

Arpan P. Mahorowala, A. Mahorowala, 1998 .

Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists

Marie Angelopoulos, Karen Petrillo, Qinghuang Lin, 2002, SPIE Advanced Lithography.

IBM 193-nm bilayer resist: materials, lithographic performance, and optimization

George M. Jordhamo, Phillip J. Brock, Arpan P. Mahorowala, 2001, SPIE Advanced Lithography.

Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond

Scott Halle, Marie Angelopoulos, Karen Petrillo, 2003, SPIE Advanced Lithography.

Transfer etching of bilayer resists in oxygen-based plasmas

Donald C. Hofer, Marie Angelopoulos, John P. Simons, 2000 .

Etching of polysilicon in inductively coupled Cl2 and HBr discharges. IV. Calculation of feature charging in profile evolution

Arpan P. Mahorowala, Herbert H. Sawin, H. Sawin, 2002 .

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Gregg M. Gallatin, Dario L. Goldfarb, Marie Angelopoulos, 2004 .