Bhanwar Singh

发表

Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California

Bhanwar Singh, 2000 .

Automated OPC optimization using in-line CD-SEM

Bo Su, Bhanwar Singh, Mina Menaker, 2000 .

Intelligent integrated lithography control system on the basis of product design and yield feedback system and method of use

Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, 2003 .

Specular spectroscopic profilometry for the sub-0.18-um polySi-gate processes

Bhanwar Singh, Xinhui Niu, Nickhil H. Jakatdar, 2000, Advanced Lithography.

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

Bhanwar Singh, 1998 .

Linewidth Measurement By Low Voltage SEM

William H. Arnold, Bhanwar Singh, 1988, Advanced Lithography.

Greater process tolerance range using discrete assist features

Bhanwar Singh, Itty Matthew, 2006 .

An I-Line Image Reversal Process For Submicron Lithography

Bhanwar Singh, Ron Chu, 1989, Advanced Lithography.

Advanced DFM applications using design-based metrology on CD SEM

Bernd Schulz, Cyrus E. Tabery, Bhanwar Singh, 2006, SPIE Advanced Lithography.

Across-wafer CD uniformity control through lithography and etch process: experimental verification

Costas J. Spanos, Kameshwar Poolla, Qiaolin Zhang, 2007, SPIE Advanced Lithography.

Impact of optical absorption on process control for sub-0.15-nm device patterning using 193-nm lithography

Harry J. Levinson, Bhanwar Singh, Uzodinma Okoroanyanwu, 2000, Advanced Lithography.

Improved resist profiles and CD control through optimized thin dielectric stacks

Bhanwar Singh, Christopher F. Lyons, Mahesh Agrawal, 1995, Advanced Lithography.

Evaluation of atomic force microscopy: comparison with electrical CD metrology and low-voltage scanning electron microscopy

Bhanwar Singh, Sanjay K. Yedur, 1999, Advanced Lithography.

Plasma etch process characterization: an application of atomic force microscopy

Wenge Yang, Bhanwar Singh, 1998, Advanced Lithography.

Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA

Angela Duparré, Bhanwar Singh, Ghanim A. Al-Jumaily, 2000 .

Comprehensive CD uniformity control across lithography and etch

Costas J. Spanos, Kameshwar Poolla, Qiaolin Zhang, 2005, SPIE Advanced Lithography.

Deep-UV reflection control for patterning dielectric layers

Bhanwar Singh, Ramkumar Subramanian, Christopher F. Lyons, 1998, Advanced Lithography.

Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry: 157 nm and below

Corey L. Bungay, James N. Hilfiker, Bhanwar Singh, 2000, Advanced Lithography.

Time-based PEB adjustment for optimizing CD distributions

Bhanwar Singh, Cherry Tang, Bernd Schulz, 2004, SPIE Advanced Lithography.

Advanced characterization techniques for optical, semiconductor, and data storage components : 9-11 July 2002 Seattle, Washington, USA

Angela Duparré, Bhanwar Singh, 2002 .

Efficient and cost-effective photo defect monitoring

Bhanwar Singh, Khoi A. Phan, Robert J. Chiu, 1998, Advanced Lithography.

0.5-μm photolithography using high-numerical-aperture I-line wafer steppers

William H. Arnold, Anna Maria Minvielle, Bhanwar Singh, 1990, Advanced Lithography.

Metrology issues associated with submicron linewidths

John L. Nistler, Bhanwar Singh, Khoi A. Phan, 1991, Other Conferences.

Mehrschichtüberlagerungsmessungs- and correction technology for IC manufacturing

Bhanwar Singh, Khoi A. Phan, Bharath Rangarajan, 2005 .

Realizing value-added metrology

Bryan J. Rice, Pete Lipscomb, Dilip Patel, 2007, SPIE Advanced Lithography.

Phase-shift mask technology: requirements for e-beam mask lithography

William H. Arnold, John L. Nistler, Anna Maria Minvielle, 1991, Other Conferences.

Sub-0.35-um critical dimension metrology using atomic force microscopy

William H. Arnold, Bhanwar Singh, Kathryn Guarini, 1996, Advanced Lithography.

Intra-wafer CDU characterization to determine process and focus contributions based on scatterometry metrology

Mircea Dusa, Paul Friedberg, Bhanwar Singh, 2004, SPIE Advanced Lithography.

Characterization, modeling, and impact of scattered light in low-k1 lithography

Harry J. Levinson, Anita Fumar-Pici, Yunfei Deng, 2004, SPIE Advanced Lithography.

Measurement of multilayer film and reflectivity on wafers using ultraviolet-visible microspectrophotometry

Bhanwar Singh, Vincent J. Coates, Warren W Lin, 1992, Advanced Lithography.

Across-wafer CD uniformity enhancement through control of multizone PEB profiles

Costas J. Spanos, Kameshwar Poolla, Qiaolin Zhang, 2004, SPIE Advanced Lithography.

Automated process control monitor for 0.18-um technology and beyond

Bernd Schulz, Bhanwar Singh, Bryan K. Choo, 2000, Advanced Lithography.

Scatterometry-based overlay metrology

Kenneth C. Johnson, Bhanwar Singh, Hsu-Ting Huang, 2003, SPIE Advanced Lithography.

Toward a unified advanced CD-SEM specification for sub-0.18-μm technology

Charles N. Archie, Michael T. Postek, Herschel M. Marchman, 1998, Advanced Lithography.

Triticale (Triticosecale) Germplasm with Multiple Tolerances to Wheat Pest and Diseases

Bhanwar Singh, Vinod, S. K. Tomar, 2005 .

Semiwafer metrology project

Bhanwar Singh, Don E. Yansen, Lynda C. Hannemann-Mantalas, 1991, Other Conferences.

Integrated circuit wafer reflectivity measurement in the UV and DUV and its application for ARC characterization

Bhanwar Singh, Sesh Ramaswami, Warren W Lin, 1993, Advanced Lithography.

Process control and optimization of conventional metal process for 0.18-micron logic technology

Stuart E. Brown, Bhanwar Singh, Ramkumar Subramanian, 2000, Advanced Lithography.

Combined use of x-ray reflectometry and spectroscopic ellipsometry for characterization of thin film optical properties

Bhanwar Singh, Jason P. Cain, Qiaolin Zhang, 2006, SPIE Advanced Lithography.

Characterizing post-exposure bake processing for transient- and steady-state conditions in the context of critical dimension control

Costas J. Spanos, Bhanwar Singh, David Ashby Steele, 2002, SPIE Advanced Lithography.

Advanced characterization techniques for optics, semiconductors, and nanotechnologies II : 2-4 August, 2005, San Diego, California, USA

Angela Duparré, Zu-Han Gu, Bhanwar Singh, 2003 .

Improving stigmation control of the CD-SEM

Mark P. Davidson, Bhanwar Singh, Michael K. Templeton, 2000, Advanced Lithography.

Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA

Bhanwar Singh, David Burnett, Shin'ichiro Kimura, 2000 .

Sub-100-nm and deep sub-100-nm MOS transistor gate patterning

Christopher A. Spence, Qi Xiang, Bhanwar Singh, 1998, Advanced Lithography.

Atomic force microscopy for cross section inspection and metrology

William H. Arnold, Bhanwar Singh, Calvin F. Quate, 1996 .

Photo‐induced optical effects in obliquely deposited amorphous Se‐Ge films

Bhanwar Singh, K. L. Chopra, S. Rajagopalan, 1979 .

Electron beam and scanning probe lithography: A comparison

Bhanwar Singh, Calvin F. Quate, Kathryn Wilder, 1998 .

Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III

Angela Duparré, Zu-Han Gu, Bhanwar Singh, 2003 .

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) | NIST

Charles N. Archie, Michael T. Postek, Bhanwar Singh, 2000 .