Rangaswamy Srinivasan

发表

Ablation Of Polymers With Pairs Of Ultraviolet Laser Pulses With Controlled Temporal Separation

Bodil Braren, Rangaswamy Srinivasan, 1989, Other Conferences.

Ablative photodecomposition of polymer films by pulsed far‐ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditions

Bodil Braren, Rangaswamy Srinivasan, R. Srinivasan, 1984 .

Ultrafast imaging of ultraviolet laser ablation and etching of polymethylmethacrylate

Bodil Braren, Kelly G. Casey, Rangaswamy Srinivasan, 1989 .

The significance of a fluence threshold for ultraviolet laser ablation and etching of polymers

Bodil Braren, Kelly G. Casey, Rangaswamy Srinivasan, 1990 .

Use of temporally coincident ultraviolet laser pulses of two different wavelengths to ablate organic polymers

Bodil Braren, Rangaswamy Srinivasan, R. Srinivasan, 1990 .

Nanosecond photoacoustic studies on ultraviolet laser ablation of organic polymers

Rangaswamy Srinivasan, R. Srinivasan, P. Dyer, 1986 .

High-resolution positive resists for electron-beam exposure

Michael Hatzakis, Rangaswamy Srinivasan, M. Hatzakis, 1968 .

Ablation and etching of polymethylmethacrylate by very short (160 fs) ultraviolet (308 nm) laser pulses

Bodil Braren, Rangaswamy Srinivasan, R. Srinivasan, 1987 .

Calorimetric and acoustic study of ultraviolet laser ablation of polymers

G. Gorodetsky, Rangaswamy Srinivasan, G. Gorodetsky, 1985 .

Nature of ‘‘incubation pulses’’ in the ultraviolet laser ablation of polymethyl methacrylate

Bodil Braren, Kelly G. Casey, Rangaswamy Srinivasan, 1990 .