H. S. Lee

Improvement of underwater colour correction using standard deviation ratio

Il Kyu Eom, H. S. Lee, S. W. Moon, 2020 .

Chemical and mechanical balance in polishing of electronic materials for defect-free surfaces

H. S. Lee, Haedo Jeong, Haedo Jeong, 2009 .

Semi-empirical material removal rate distribution model for SiO2 chemical mechanical polishing (CMP) processes

David Dornfeld, H. S. Lee, D. Dornfeld, 2013 .

Design and Reliability of Layered Ceramics

H. S. Lee, J. Song, M. Shin, 2010 .

Semi-empirical material removal rate distribution model for SiO2 chemical mechanical polishing (CMP) processes

H. S. Lee, D. Dornfeld, Haedo Jeong, 2013 .