M. Kouda

SrO capping effect for La2O3/Ce-silicate gate dielectrics

Hiroshi Iwai, Nobuyuki Sugii, Kuniyuki Kakushima, 2010, Microelectron. Reliab..

Nanoscale electrical and physical study of polycrystalline high-κ dielectrics and proposed reliability enhancement techniques

K. Kakushima, H. Iwai, Z. R. Wang, 2011, 2011 International Reliability Physics Symposium.

Grain boundary assisted degradation and breakdown study in cerium oxide gate dielectric using scanning tunneling microscopy

Hiroshi Iwai, Nagarajan Raghavan, Kuniyuki Kakushima, 2011 .

Charged defects reduction in gate insulator with multivalent materials

K. Kakushima, H. Iwai, N. Umezawa, 2006, 2009 Symposium on VLSI Technology.

Valence number transition and silicate formation of cerium oxide films on Si(100)

H. Iwai, Nobuyuki Sugii, Kuniyuki Kakushima, 2012 .