John S. Petersen

Evaluation of SCAA mask technology as a pathway to the 65-nm node

James V. Beach, John S. Petersen, Mark J. Maslow, 2003, SPIE Advanced Lithography.

High-transmission attenuated PSM: benefits and limitations through a validation study of 33%, 20%, and 6% transmission masks

Martin McCallum, John S. Petersen, Nishrin Kachwala, 2000, Advanced Lithography.

Binary halftone chromeless PSM technology for λ/4;optical lithography

John S. Petersen, Waiman Ng, Kent H. Nakagawa, 2001, SPIE Advanced Lithography.

Imaging contrast improvement for 160-nm line features using subresolution assist features with binary, six percent ternary attenuated phase-shift mask with process-tuned resist

Martin McCallum, John S. Petersen, Nishrin Kachwala, 1999, Advanced Lithography.

Advanced FTIR techniques for photoresist process characterization

John S. Petersen, Jeff D. Byers, Ronald A. Carpio, 1997, Advanced Lithography.

Parameter extraction for 157-nm photoresists

John S. Petersen, Will Conley, Joseph J. Bendik, 2002, SPIE Advanced Lithography.