Diane C. McCafferty

Evaluation of SCAA mask technology as a pathway to the 65-nm node

James V. Beach, John S. Petersen, Mark J. Maslow, 2003, SPIE Advanced Lithography.

Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system

Diane C. McCafferty, Harry Sewell, Pankaj Raval, 2002, SPIE Advanced Lithography.

Evaluation of the dual exposure technique

Diane C. McCafferty, Harry Sewell, Victor F. Bunze, 2001, SPIE Advanced Lithography.

Benchmarking multimode CD-SEM metrology to 180 nm

Diane C. McCafferty, Harry Sewell, Javed Sumra, 1996, Advanced Lithography.