J. T. C. Lee

A comparison of HDP sources for polysilicon etching

J. T. C. Lee, J. T. Lee, 1996 .

Plasma etching process development using in situ optical emission and ellipsometry

William M. Mansfield, Fred P. Klemens, J. T. C. Lee, 1996 .

Dynamic images of plasma processes: Use of Fourier blobs for endpoint detection during plasma etching of patterned wafers

Edward A. Rietman, Nace Layadi, J. T. C. Lee, 1998 .

Feature evolution during plasma etching. II. Polycrystalline silicon etching

M. V. Malyshev, Fred P. Klemens, J. T. C. Lee, 2000 .

Comparison of advanced plasma sources for etching applications. I. Etching rate, uniformity, and profile control in a helicon and a multiple electron cyclotron resonance source

Fred P. Klemens, R. A. Gottscho, Herbert H. Sawin, 1994 .

Role of sidewall scattering in feature profile evolution during Cl2 and HBr plasma etching of silicon

M. V. Malyshev, D. B. Graves, Vincent M. Donnelly, 2000 .