Michael A. Carcasi

Process-induced bias: a study of resist design and process implications

Carlos Fonseca, Takahisa Otsuka, Steven Scheer, 2008, SPIE Advanced Lithography.

The optimizations of resist shrink process using track-based technology

Takashi Saito, Satoru Shimura, Yoshihiro Kondo, 2010, Advanced Lithography.

Extension of 248 nm Monte Carlo, mesoscale models to 193 nm platforms

Mark Somervell, Michael A. Carcasi, Steven Scheer, 2010, Advanced Lithography.

Process-induced bias: a study of resist design, device node, illumination conditions, and process implications

Carlos Fonseca, Yoshihiro Kondo, Tsuyoshi Shibata, 2009, Advanced Lithography.

Particle generation during photoresist dissolution

Chris A. Mack, Roger T. Bonnecaze, C. Grant Willson, 2010, Advanced Lithography.

Fabrication of 32-nm contact/via hole by photolithographic-friendly method

Satoru Shimura, Tetsu Kawasaki, Mark Somervell, 2008, SPIE Advanced Lithography.

Simulation and experimentation of PSCAR chemistry for complex structures

Akihiro Oshima, Seiji Nagahara, Seiichi Tagawa, 2017, Advanced Lithography.

Line-pattern collapse mitigation status for EUV at 32nm HP and below

Yuichiro Miyata, Shinichiro Kawakami, Michael A. Carcasi, 2012, Other Conferences.