Koichi Fujiwara

Process development for high scan speed ArF immersion lithography

Hideharu Kyoda, Junichi Kitano, Nobuji Matsumura, 2008, SPIE Advanced Lithography.

Double patterning process with freezing technique

Shiro Kusumoto, Koichi Fujiwara, Yoshikazu Yamaguchi, 2009, Advanced Lithography.

Non-chemically amplified resists for 193 nm lithography

C. Grant Willson, Koji Ito, Koichi Fujiwara, 2008, SPIE Advanced Lithography.

Eutectic Silver-Silicon Internally Oxidized Contacts

Koichi Fujiwara, Kishio Arita, S. Tsurumi, 1981 .

Simplified double patterning process with non-topcoat self-freezing resist

Koji Ito, Kentaro Goto, Koichi Fujiwara, 2010, Advanced Lithography.

CD uniformity improvement for double-patterning lithography (litho-litho-etch) using freezing process

Shiro Kusumoto, Tsuyoshi Shibata, Junichi Kitano, 2009, Advanced Lithography.

A Laser Magnet Immunoassay With Ultra High Sensitivity For Direct Antigen Detection

Koichi Fujiwara, H. Mizutani, M. Suzuki, 1991, Proceedings of the Annual International Conference of the IEEE Engineering in Medicine and Biology Society Volume 13: 1991.

Performance comparison of chemically amplified resists under EUV, EB, and KrF exposure

Nobuji Matsumura, Koichi Fujiwara, Yoshikazu Yamaguchi, 2006, SPIE Advanced Lithography.

Novel EUV resist development for sub-14 nm half pitch

Koichi Fujiwara, 2017, 2017 China Semiconductor Technology International Conference (CSTIC).

Study of Metal Transfer in Electrical Contacts by Radioactive Tracer Method

Koichi Fujiwara, Yoichiro Yamaguchi, 1975 .

Freezing Material Development for Double Patterning Process

Shiro Kusumoto, Koichi Fujiwara, Yoshikazu Yamaguchi, 2009 .

Surface Impurities of Gold and Copper Prepared by Various Surface Treatments and Adhesion

Koichi Fujiwara, 1976 .

Progress in EUV resist development

Iwao Nishiyama, Koichi Fujiwara, Tsutomu Shimokawa, 2007 .