Jeff Wilson

ECO fill: automated fill modification to support late-stage design changes

Greg Davis, Jeff Wilson, J. J. Yu, 2014, Advanced Lithography.

20nm CMP model calibration with optimized metrology data and CMP model applications

Jeff Wilson, Ushasree Katakamsetty, Sky Yeo, 2015, Advanced Lithography.

On the extent of head motion in listening tests and individual measurements using different head-tracking sensors

György Wersényi, Jeff Wilson, 2015 .

The NAVE: Design and implementation of a 3D audio system for a low cost spatially immersive display

Jarrell Pair, Jeff Wilson, 2000 .

Using a highly accurate self-stop Cu-CMP model in the design flow

Takashi Sakairi, Jeff Wilson, Shunichi Shibuki, 2010, Advanced Lithography.