Lee-Ju Kim

发表

Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Seung-Weon Paek, Ki-Soo Shin, Cheol Shin, 2001, Photomask Japan.

Investigations on microloading effect: a parallel approach to PGSD (proximity gap suction development)

Hong-Seok Kim, Lee-Ju Kim, Daniel Courboin, 2004, Photomask Japan.

ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM

Kyung-Han Nam, Lee-Ju Kim, Kyu-Yong Lee, 1999, Photomask and Next Generation Lithography Mask Technology.

Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2001, SPIE Photomask Technology.

TiSi-nitride-based attenuated phase-shift mask for ArF lithography

Ki-Ho Baik, Chul Shin, Lee-Ju Kim, 1999, Photomask Technology.

CD performance evaluation according to advanced marking parameter

Hong-Seok Kim, Sung-Jin Choi, Lee-Ju Kim, 2009, Photomask Japan.

Improvement of defect density for DUV halftone PSM

Lee-Ju Kim, Sang Woon Lee, Kyu-Yong Lee, 2000, Photomask Japan.

Enhanced capability improvement using OPC pattern generation at laser lithography

Kyung-Han Nam, Lee-Ju Kim, In-Soo Lee, 2001, Photomask Japan.

Investigation on micro-trench formation of alternating aperture phase shift masks

Chang-Nam Ahn, Lee-Ju Kim, Hong-Seok Kim, 2003, Photomask Japan.

Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool

Lee-Ju Kim, Cheol Shin, Junsik S. Cho, 2002, SPIE Photomask Technology.

Characteristics of RIE lag and pattern density effect in alternating aperture phase shift masks

Chang-Nam Ahn, Byung-Soo Chang, Lee-Ju Kim, 2005, SPIE Photomask Technology.

Study on the potentialities of sub-100nm optical lithography of alternating and phase-edge phase shift mask for ArF lithography

Chang-Nam Ahn, Seung-Weon Paek, Hee-Bom Kim, 2001 .