Jaime D. Morillo

New paradigm in lens metrology for lithographic scanner: evaluation and exploration

Kafai Lai, Gregg M. Gallatin, Mark A. van de Kerkhof, 2004, SPIE Advanced Lithography.

Combined level-to-level and within-level overlay control

Christopher P. Ausschnitt, Jaime D. Morillo, Roger J. Yerdon, 2002, SPIE Advanced Lithography.

Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control

Jaime D. Morillo, Eric P. Solecky, 2004, SPIE Advanced Lithography.