Julien Ducoté

Target design optimization for overlay scatterometry to improve on-product overlay

Henk-Jan H. Smilde, Richard J. F. van Haren, Willy van Buël, 2015, Advanced Lithography.

Contour based metrology: “make measurable what is not so"

Patrick Schiavone, Julien Ducoté, Charlotte Beylier, 2020, Advanced Lithography.

Advanced metrology by offline SEM data processing

Amine Lakcher, Julien Ducoté, Vincent Farys, 2017, European Mask and Lithography Conference.

Microlens under melt in-line monitoring based on application of neural network automatic defect classification

Amine Lakcher, Julien Ducoté, Alain Ostrovsky, 2018, European Mask and Lithography Conference.