Katsuhiko Wakana

Optical performance of laser light source for ArF immersion double patterning lithography tool

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field

Shinji Nagai, Yoshifumi Ueno, Georg Soumagne, 2018, Photomask Technology.