Xueli Hao

Enhanced methodology of focus control and monitoring on scanner tool

Ye Tian, Young Ki Kim, Yen-Jen Chen, 2017, Advanced Lithography.

Overlay control for 7nm technology node and beyond

Michael Hsieh, Karsten Gutjahr, Yen-Jen Chen, 2018, Advanced Lithography.

Accuracy improvement in advance lithography focus control

Young Ki Kim, Xueli Hao, Dongyue Yang, 2020 .

New methodologies: Development of focus monitoring on product

Christian Sparka, Xueli Hao, Juan-Manuel Gomez, 2017, 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO).

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Kun Gao, Karsten Gutjahr, Xueli Hao, 2019, Advanced Lithography.

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Karsten Gutjahr, Xueli Hao, 2019, Advanced Lithography.

New methodologies: Development of focus monitoring on product

Christian Sparka, Xueli Hao, Juan-Manuel Gomez, 2017, ASMC 2017.

Focus control enhancement and on-product focus response analysis methodology

Ye Tian, Young Ki Kim, Yen-Jen Chen, 2016, SPIE Advanced Lithography.