I. Pouilloux

Single-wafer/mini-batch approach for fast cycle time in advanced 300-mm fab

D. Mercier, E. Mastromatteo, O. Bonnin, 2003 .

Anticipation of nitrided oxides electrical thickness based on XPS measurement

M. Bidaud, J. Bienacel, D. Roy, 2004 .

High density and high speed SRAM bit-cells and ring oscillators due to laser annealing for 45nm bulk CMOS

N. Planes, D. Delille, T. Skotnicki, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..