Dan Bald

E-beam mask repair: fundamental capability and applications

Alan R. Stivers, Ted Liang, Eric Frendberg, 2004, SPIE Photomask Technology.

Real time monitoring of reticle etch process tool to investigate and predict critical dimension performance

Ki-Ho Baik, Frank E. Abboud, Karmen Yung, 2007, SPIE Advanced Lithography.

Demonstration of damage-free mask repair using electron beam-induced processes

Klaus Edinger, Michael Budach, Alan R. Stivers, 2004, Photomask Japan.

DIVAS: an integrated networked system for mask defect dispositioning and defect management

Vikram Tolani, Dan Bald, Saghir Munir, 2003, SPIE Advanced Lithography.

DIVAS: fully automated simulation based mask defect dispositioning and defect management system

Vikram Tolani, Dan Bald, Saghir Munir, 2004, SPIE Photomask Technology.