Yaniv Abramovitz

发表

Accelerating on-device overlay metrology accuracy verification

Sandip Halder, Philippe Leray, Shimon Levi, 2020, Advanced Lithography.

Accuracy assessment between on-product and on-optical-target overlay metrology with SEM and STEM

Sandip Halder, Philippe Leray, Shimon Levi, 2020 .

The importance of in-die sampling using E-beam solution on yield improvement

Yaniv Abramovitz, Omri Baum, Yu Zhang, 2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.

EPE budget analysis and margin co-optimization on the multiple critical on-device features in a single image for yield enhancement

Yaniv Abramovitz, Kevin Houchens, Insung Kim, 2021 .