Phong Do
发表
Optimized filtration for reduced defectivity and improved dispense recipe in 193-nm BARC lithography
Thomas Lehmann,
Barry Gotlinsky,
Michael Mesawich,
2004,
SPIE Advanced Lithography.
Travis R. Goodwin,
Dina Demner-Fushman,
Kin Wah Fung,
2018,
TAC.