W. J. Eysenga

Electronic Components, Technology and Materials

Pasqualina M. Sarro, Joachim N. Burghartz, J. W. Metselaar, 1998 .

Parameter calibration on post-ion-implantation dopant diffusions

W. J. Eysenga, W. Crans, J. Fu, 2004, 5th International Conference on Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, 2004. EuroSimE 2004. Proceedings of the.