Joan K. Bosworth

New self-assembly strategies for next generation lithography

Evan L. Schwartz, Christopher K. Ober, Joan K. Bosworth, 2010, Advanced Lithography.

20 nm pitch directed block copolymer assembly using solvent annealing for bit patterned media

Ricardo Ruiz, Elizabeth A. Dobisz, Joan K. Bosworth, 2010 .

Directed Self-Assembly of POSS Containing Block Copolymer on Lithographically Defined Chemical Template with Morphology Control by Solvent Vapor

Yasuhiko Tada, Hiroshi Yoshida, Ricardo Ruiz, 2012 .