P. van der Walle

EBL2: a flexible and controlled EUV exposure and surface analysis system

N. B. Koster, Alex Deutz, E. te Sligte, 2015 .

RapidNano: Towards 20nm Particle Detection on EUV Mask Blanks

Erik Fritz, Peter Bussink, P. van der Walle, 2016 .

Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers

Paul F. A. Alkemade, Diederik J. Maas, P. van der Walle, 2016 .