K. K. Ko

Photoreflectance study of the chemically modified (100) GaAs surface

Stella W. Pang, Orest J. Glembocki, John A. Dagata, 1994, Photonics West - Lasers and Applications in Science and Engineering.

Etching of photoresist using oxygen plasma generated by a multipolar electron cyclotron resonance source

Stella W. Pang, K. K. Ko, K. T. Sung, 1992 .

Photoluminescence and electro‐optic properties of small (25–35 nm diameter) quantum boxes

K. K. Ko, P. Bhattacharya, M. Rooks, 1993 .

The influence of ion energy, ion flux, and etch temperature on the electrical and material quality of GaAs etched with an electron cyclotron resonance source

K. K. Ko, S. Pang, M. Cole, 1995 .

Photoreflectance Characterization of Etch-Induced Damage in Dry Etched GaAs

J. A. Tuchman, K. K. Ko, S. Pang, 1993 .

Comparison between etching in Cl2 and BCl3 for compound semiconductors using a multipolar electron cyclotron resonance source

K. K. Ko, S. Pang, 1992 .

Surface Damage on GaAs Etched Using a Multipolar Electron Cyclotron Resonance Source

K. K. Ko, S. Pang, 1994 .

Evaluation of Surface Damage on GaAs Etched with an Electron-Cyclotron-Resonance Source

K. K. Ko, T. Brock, S. Pang, 1994 .

Effects of electron cyclotron resonance etching on the ambient (100) GaAs surface

J. A. Tuchman, K. K. Ko, S. Pang, 1995 .

Electronic properties of GaAs surfaces etched in an electron cyclotron resonance source and chemically passivated using P2S5

J. A. Tuchman, K. K. Ko, J. Dagata, 1998 .