Alfred Wagner
发表
Josef Mocivnik,
Rene Egger-Mocivnik,
Alfred Wagner,
2005
.
Wilfried Bullinger,
Alfred Wagner,
Michael Fehring,
2003
.
William D. Hinsberg,
Frances A. Houle,
Geoffrey W. Burr,
2009,
Advanced Lithography.
Kenneth C. Racette,
Monica Barrett,
Robert Nolan,
2008,
Photomask Technology.
Lei Sun,
Ming He,
Scott Halle,
2012,
Advanced Lithography.
Kafai Lai,
Scott Halle,
Aasutosh Dave,
2010,
Advanced Lithography.
Alfred Wagner,
Catherine Bandle,
C. Bandle,
2015,
J. Optim. Theory Appl..
Takeshi Isogawa,
Kazunori Seki,
Emily Gallagher,
2014,
Photomask and Next Generation Lithography Mask Technology.
Richard Wistrom,
Yasutaka Kikuchi,
Emily Gallagher,
2008,
Photomask Technology.
Alfred Wagner,
1979
.
Scott Halle,
Bernhard Kneer,
Emily Gallagher,
2009,
Advanced Lithography.
Kafai Lai,
Scott Halle,
Emily Gallagher,
2010,
Photomask Technology.
Alfred Wagner,
Benno Kathan,
2005
.
Alfred Wagner,
Dennis M. Hayden,
Timothy E. Neary,
1998,
Photomask Technology.
Alfred Wagner,
Andrew D. Dubner,
Patricia G. Blauner,
1993,
Advanced Lithography.
Monica Barrett,
Robert Nolan,
Kevin Duong,
2010,
Photomask Japan.
Alfred Wagner,
James P. Levin,
Patricia G. Blauner,
1990,
Advanced Lithography.
Alfred Wagner,
Michael Albrecht,
Lorenz Winter,
1999
.
Alfred Wagner,
Peter P. Longo,
Richard Haight,
2005,
SPIE LASE.
Kazunori Seki,
Emily Gallagher,
Toshio Konishi,
2013,
Photomask and Next Generation Lithography Mask Technology.
Alfred Wagner,
A. Wagner,
1983,
Advanced Lithography.
Walter Eberle,
Ralf Bogenrieder,
Guido Villino,
2003
.
Michael I. Current,
Alfred Wagner,
1983,
Advanced Lithography.
Alfred Wagner,
Peter P. Longo,
Richard Haight,
2002,
Photomask Technology.
Alfred Wagner,
A. Wagner,
2003
.
Alfred Wagner,
1984
.
Alfred Wagner,
Peter P. Longo,
Richard Haight,
2003
.
Scott Halle,
Yasutaka Kikuchi,
Ryan Deschner,
2010
.
Alfred Wagner,
A. Wagner,
A. Dubner,
1989
.
Alfred Wagner,
Andrew D. Dubner,
James P. Levin,
1992
.
Alfred Wagner,
Dennis M. Hayden,
Timothy E. Neary,
1999
.