Jorge M. Poplawski

Characterization of overlay mark fidelity

David Laidler, Ivan Pollentier, Mark Ghinovker, 2003, SPIE Advanced Lithography.

A comparison of methods for in-chip overlay control at the 65-nm node

John C. Robinson, Mike Adel, Jorge M. Poplawski, 2004, SPIE Advanced Lithography.

Improved overlay metrology device correlation on 90-nm logic processes

Kouichirou Tsujita, Hiroyuki Kurita, Mark Ghinovker, 2004, SPIE Advanced Lithography.

Overlay metrology simulations: analytical and experimental validations

Richard M. Silver, Joel L. Seligson, Jorge M. Poplawski, 2003, SPIE Advanced Lithography.