Rogier Cortie

High-n immersion lithography

Jan Mulkens, Paul Graeupner, Harry Sewell, 2008, SPIE Advanced Lithography.

Reduced-order model technique for the analysis of anisotropic inhomogeneous media: application to liquid-crystal displays.

Oscar Antonio Peverini, Renato Orta, Riccardo Tascone, 2002, Journal of the Optical Society of America. A, Optics, image science, and vision.