Charles W. Magee

Low-temperature Si in-situ cleaning and homoepitaxy by remote plasma-enhanced chemical vapor deposition

Sanjay K. Banerjee, Al F. Tasch, Ting-Chen Hsu, 1990, Other Conferences.

Silicon as a Millimeter-Wave Monolithically Integrated Substrate - A New Look

A. Rosen, M. Caulton, Walter M. Janton, 1981 .

On the use of CsX+ cluster ions for major element depth profiling in secondary ion mass spectrometry

Charles W. Magee, C. Magee, William L. Harrington, 1990 .

Ion beams in silicon processing and characterization

Mark E. Law, Michael I. Current, S. T. Picraux, 1997 .

A SIMS analysis of deuterium diffusion in hydrogenated amorphous silicon

D. E. Carlson, Charles W. Magee, C. Magee, 1978 .

Secondary ion mass spectrometry and its relation to high-energy ion beam analysis techniques

Charles W. Magee, C. Magee, 1981 .