Armin Bayer

发表

Compact EUV source and optics for applications apart from lithography

Armin Bayer, Frank Barkusky, Christian Peth, 2006, SPIE Optics + Photonics.

Radiation hardness of AlxGa1-xN photodetectors exposed to Extreme UltraViolet (EUV) light beam

Kai Cheng, Robert Mertens, Piet De Moor, 2009, Optics + Optoelectronics.

Active beam control for the EUV/XUV spectral range using an adaptive Kirkpatrick-Baez arrangement

Klaus Mann, Armin Bayer, Frank Barkusky, 2008, Optical Systems Design.

Characterization of absorptance losses in optical materials using a high resolution Hartmann-Shack wavefront sensor

Uwe Leinhos, Armin Bayer, Frank Barkusky, 2008, SPIE LASE.

Damage and degradation of optics and sensors under intense EUV radiation from a table-top laser produced plasma source

Klaus Mann, Armin Bayer, Frank Barkusky, 2009, Laser Damage.

Damage testing of EUV optics and sensors using focused radiation from a table-top LPP source

Klaus Mann, Armin Bayer, Frank Barkusky, 2010, Advanced Lithography.

Compact source and beam delivery system for EUV radiation

Klaus R. Mann, Armin Bayer, Frank Barkusky, 2006, SPIE Advanced Lithography.

Imaging properties of different optics for EUV radiation

Torsten Feigl, Norbert Kaiser, Klaus R. Mann, 2005, SPIE Optical Systems Design.

Direct photo-etching of PMMA by focused EUV radiation from a compact laser plasma source

Armin Bayer, Frank Barkusky, Christian Peth, 2008, SPIE LASE.

Direct structuring of solids by EUV radiation from a table-top laser produced plasma source

Klaus R. Mann, Armin Bayer, Frank Barkusky, 2009, Optics + Optoelectronics.

Compact EUV source and optics for direct structuring of surfaces

Armin Bayer, Frank Barkusky, Christian Peth, 2007, SPIE LASE.

Long-term laser induced contamination tests of optical elements under vacuum at 351nm

Denny Wernham, Martin Endemann, Adrian Tighe, 2010, Laser Damage.

Measurement of wavefront distortions in DUV optics due to lens heating

Uwe Leinhos, Armin Bayer, Klaus Mann, 2011, Advanced Lithography.

Compact EUV source and Schwarzschild objective for modification and ablation of various materials

Klaus R. Mann, Armin Bayer, Frank Barkusky, 2007, SPIE Optics + Optoelectronics.

Comprehensive laser beam characterization for applications in material processing

Klaus R. Mann, Armin Bayer, Bernd Schäfer, 2009, LASE.

A novel photo-thermal setup for determination of absorptance losses and wavefront deformations in DUV optics

Uwe Leinhos, Armin Bayer, Klaus Mann, 2008, SPIE Advanced Lithography.

Long-term laser irradiation tests of optical elements for ESA mission ADM-Aeolus

Denny Wernham, Federico Pettazzi, Uwe Leinhos, 2010, Optical Engineering + Applications.

Applications of compact laser-driven EUV/XUV plasma sources

Klaus Mann, Armin Bayer, Frank Barkusky, 2009, Optics + Optoelectronics.

Direct photo-etching of poly"methyl methacrylate… using focused extreme ultraviolet radiation from a table-top laser-induced plasma source

Armin Bayer, Frank Barkusky, Christian Peth, 2007 .

Direct photoetching of polymers using radiation of high energy density from a table-top extreme ultraviolet plasma source

Armin Bayer, Frank Barkusky, Christian Peth, 2009 .

Radiation damage resistance of AlGaN detectors for applications in the extreme-ultraviolet spectral range.

Joachim John, Armin Bayer, Frank Barkusky, 2009, The Review of scientific instruments.

Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source.

Armin Bayer, Frank Barkusky, Stefan Döring, 2010, Optics express.

High Temperature Operation of a Solid Polymer Electrolyte Fuel Cell Stack Based on a New Ionomer Membrane

Vincenzo Antonucci, Francesco Sergi, Armin Bayer, 2009, ECS Transactions.

Absolute measurement of surface and bulk absorption in DUV optics from temperature induced wavefront deformation.

Armin Bayer, Bernd Schäfer, Klaus Mann, 2010, Optics express.