Jerald Feldman

Fluoropolymers for 157-nm lithography: optical properties from VUV absorbance and ellipsometry measurements

Roger H. French, James N. Hilfiker, Robert C. Wheland, 2000, Advanced Lithography.

157-nm imaging using thick single-layer resists

Roger H. French, Fredrick C. Zumsteg, Jerald Feldman, 2001, SPIE Advanced Lithography.

New materials for 157-nm photoresists: characterization and properties

Roderick R. Kunz, Roger H. French, Fredrick C. Zumsteg, 2000, Advanced Lithography.

Single layer fluropolymer resists for 157-nm lithography

Roger H. French, Hoang V. Tran, Robert C. Wheland, 2003, SPIE Advanced Lithography.