Joni Scholten

Multi-mirror adaptive optics for control of thermally induced aberrations in extreme ultraviolet lithography

Siep Weiland, Wim Coene, Michel Habets, 2016, SPIE Advanced Lithography.

A model-free approach for auto-tuning of model predictive control

Quang N. Tran, Leyla Özkan, A.C.P.M. Backx, 2014 .