Manfred Maul

Filter means for compensating an asymmetrical pupil illumination

Damian Fiolka, Manfred Maul, 2004 .

An adjusting method for a display device

Karsten Lindig, Manfred Maul, Ersun Kartal, 2014 .

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Speckle in optical lithography and the influence on line width roughness

Jan Baselmans, James G. Tsacoyeanes, Manfred Maul, 2009, Advanced Lithography.

Optimizing and enhancing optical systems to meet the low k1 challenge

Jo Finders, Oscar Noordman, Jan Baselmans, 2003, SPIE Advanced Lithography.

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Oscar Noordman, Andre Engelen, Bernd Geh, 2010, Advanced Lithography.

Lighting system for microlithography

Manfred Maul, Wolfgang Singer, Joachim Wietzorrek, 2004 .