Jon Tomas Gudmundsson

发表

A simulation of a capacitively coupled oxygen discharge using the oopd1 particle-in-cell Monte Carlo code

Ying Wang, J. P. Verboncoeur, Lieberman, 2009 .

Low pressure hydrogen discharges diluted with argon explored using a global model

Jon Tomas Gudmundsson, J. Gudmundsson, A. T. Hjartarson, 2010 .

Global model of plasma chemistry in a low-pressure O2/F2 discharge

Jon Tomas Gudmundsson, J. Gudmundsson, 2002 .

On the effect of the electron energy distribution on the plasma parameters of an argon discharge : a global (volume-averaged) model study

Jon Tomas Gudmundsson, J. Gudmundsson, 2001 .

Magnetic induction and plasma impedance in a cylindrical inductive discharge

Michael A. Lieberman, Jon Tomas Gudmundsson, M. Lieberman, 1997 .

Foundations of DC plasma sources

Jon Tomas Gudmundsson, J. Gudmundsson, A. Hecimovic, 2017 .

The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool

Jon Tomas Gudmundsson, J. Gudmundsson, 2010 .

Oxygen discharges diluted with argon: dissociation processes

Jon Tomas Gudmundsson, J. Gudmundsson, E. G. Thorsteinsson, 2007 .

A global (volume averaged) model of a Cl2/Ar discharge: I. Continuous power

Jon Tomas Gudmundsson, J. Gudmundsson, E G Thorsteinsson, 2010 .

Improved volume-averaged model for steady and pulsed-power electronegative discharges

Michael A. Lieberman, Allan J. Lichtenberg, Jon Tomas Gudmundsson, 2006 .