Sébastien Barnola

Cleaning chamber walls after ITO plasma etching process

Salma Younesy, C. Petit-Etienne, Sébastien Barnola, 2020, Advanced Lithography.

Progresses in 300mm DUV photolithography for the development of advanced silicon photonic devices

Fabien Gays, Charles Baudot, Sylvie Menezo, 2015, Advanced Lithography.

Impact of CD and overlay errors on double-patterning processes

Martin McCallum, Isabelle Servin, Nobutaka Magome, 2009, Advanced Lithography.

Introducing photonic devices for 40Gbits/s wavelength division multiplexing transceivers on 300-mm SOI wafers using CMOS processes

Ian O'Connor, André Myko, Charles Baudot, 2014, Photonics West - Optoelectronic Materials and Devices.

Double patterning requirements for optical lithography and prospects for optical extension without double patterning

Jun Ishikawa, Martin McCallum, Shinji Wakamoto, 2008, SPIE Advanced Lithography.

Strain-enhanced performance of Si-Nanowire FETs

Sylvain Barraud, Gilles Reimbold, Gerard Ghibaudo, 2013 .