Sooryong Lee
发表
M. Ray Mercer,
Kenneth M. Butler,
Jaehong Park,
1999,
Proceedings 17th IEEE VLSI Test Symposium (Cat. No.PR00146).
Seung-Hune Yang,
Ho-Kyu Kang,
Jung-Dal Choi,
2013,
Photomask Technology.
M. Ray Mercer,
Kenneth M. Butler,
Michael R. Grimaila,
2001,
IEEE Des. Test Comput..
M. Ray Mercer,
Kenneth M. Butler,
Jaehong Park,
1999
.
Kareem Madkour,
Sooryong Lee,
Seung-Hune Yang,
2017,
Advanced Lithography.
Kevin Lucas,
Sung-Ho Lee,
Sooryong Lee,
2009,
Photomask Japan.
M. Ray Mercer,
Jaehong Park,
Michael R. Grimaila,
1999
.
Junghoon Ser,
Sooryong Lee,
Thomas Schmöller,
2011,
Advanced Lithography.
Han-Ku Cho,
Joo-Tae Moon,
Sung-Woo Lee,
2006,
SPIE Photomask Technology.
M. Ray Mercer,
Li-C. Wang,
James Wingfield,
2002,
17th IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems, 2002. DFT 2002. Proceedings..
M. Ray Mercer,
Michael R. Grimaila,
Jennifer Dworak,
2000,
Proceedings International Test Conference 2000 (IEEE Cat. No.00CH37159).
Insung Kim,
Yong-Jin Chun,
Young-Chang Kim,
2007,
Photomask Japan.
Seong-Woon Choi,
Young-Chang Kim,
Sooryong Lee,
2008,
SPIE Advanced Lithography.
Jae-Young Choi,
Sooryong Lee,
Jung-Hoe Choi,
2011,
Advanced Lithography.
M. Ray Mercer,
Michael R. Grimaila,
Jennifer Dworak,
2002,
Proceedings 2002 Design, Automation and Test in Europe Conference and Exhibition.
M. Ray Mercer,
Michael R. Grimaila,
Li-C. Wang,
1999,
International Test Conference 1999. Proceedings (IEEE Cat. No.99CH37034).
Thomas Schmoeller,
Sung-Woo Lee,
Yongfa Fan,
2010,
Advanced Lithography.
Munhoe Do,
Robert Lugg,
Sooryong Lee,
2008,
Photomask Japan.
Robert Lugg,
Yasushi Kojima,
Sooryong Lee,
2010,
Advanced Lithography.
Jonathan Cobb,
Young-Chang Kim,
Sooryong Lee,
2007,
SPIE Advanced Lithography.
James P. Shiely,
Zhijie Deng,
Thomas Schmoeller,
2010,
Photomask Technology.
Seong-Woon Choi,
Seung-Hune Yang,
Jung-Dal Choi,
2012,
Other Conferences.