Hideki Suda

Development of halftone phase-shift blank and mask fabrication for ArF lithography

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, 2000, Photomask Japan.

Development of novel W/Si materials for the single-layered attenuated phase-shifting mask

Hideki Suda, Hideaki Mitsui, Yasushi Okubo, 1994, Photomask and Next Generation Lithography Mask Technology.

Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask

Yasuki Kimura, Moitreyee Mukherjee-Roy, Hideki Suda, 2004, SPIE Advanced Lithography.

Development of MoSi-based halftone phase-shift blank and mask fabrication for ArF lithography (Photomask Japan 2000 Best Presentation Award)

Hideki Suda, Osamu Nozawa, Hitoshi Ohtsuka, 2001, SPIE Photomask Technology.

Alignment in chromeless masks

Yasuki Kimura, Moitreyee Mukherjee-Roy, Hideki Suda, 2004, SPIE Advanced Lithography.

Development of deep-UV MoSi-based embedded phase-shifting mask (EPSM) blanks

Hideo Kobayashi, Hideki Suda, Yasushi Okubo, 1996, Photomask Technology.